2" DC Plasma Magnetron Sputtering Coater for Single or Multiple Conductive Thin Films

CY-MSP300S-DC is a compact magnetron sputtering system with one 2"  target sources. DC source for coating metallic material. A film thickness tracker is included to enable the user to control processing easily. This coater is designed for coating both single or multiple film layers for a wide range of materials, such as alloy, ferroelectric, semiconductor, ceramic, dielectric, optical, PTFE  etc.  Its compactness and ease of operation make it an ideal coating system for use in R&D labs.

Technical parameters
Input Power
220VAC 50/60Hz, single phase
2000W  (including pump)

Source Power
The power source is optional with one RF power source
DC source: 500W for coating metallic materials ( below left)

Magnetron Sputtering  Head
One 2" Magnetron Sputtering Head with water cooling jackets are included to connect optional power source
Head Water Cooling: 10ml/min water flow required

Vacuum Chamber: 300 mm Dia x 300 mm height, made of high purity quartz

Sample holder size: 185mm
Rotate speed:1-20rpm adjustable
The holder temperature is adjustable from RT to 500®C Max with accuracy +/- 1.0 ®C

Vacuum Pump Station
1.High speed turbo vacuum pump system is directly installed on the vacuum chamber for max. vacuum level 
2.Heavy duty dual stage mechanical pump is connected to turbo pump for faster pump speed
3.Mobile pump station is included and the compact sputtering coater can be put on top of station
Max. vacuum level: 10^-6 torr with chamber baking

Thickness Monitor
1.One Precision quartz thickness sensor is built into the chamber to monitor coating thickness with accuracy 0.10 Å
2. LED Display Unit outside chamber can:
Input material to be coated according to data base included
Display total thickness coated and coating speed
3.5 pcs quartz sensors (consumable) are included 
4.Water cooling is required
One years limited warranty with lifetime support