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SPIE Advanced Lithography Exhibition 2016

SPIE Advanced Lithography Exhibition 2016

Date: Feb. 23, 2016 - Feb. 24, 2016
Venue: San Jose Convention Center
Address: 408 Almaden Blvd., USA, 95110, California, San Jose
City, State/Prov.:
Country: United States  
Show Details
No. of Exhibitors: 50 No. of Attendees: 2,300
Floor Size: 5,300
Trade Show Information
The Advanced Lithography Exhibition is a highly regarded exhibition for the industry's top semiconductor suppliers, integrators, and manufacturers. SPIE Advanced Lithography has been the premier international event that drives the future of lithography research and applications for more than 40 years.
See the latest technology in advanced lithography:+ Etch for nanopatterning
+ Lithography: immersion, double patterning, e-beam, EUV, optical/laser, and RET
+ Metrology, inspection, OPC, and process control
+ Design and manufacturing software
+ Materials and chemicals
+ Imaging equipment
+ Lasers
+ Resist materials and processing
+ Nano-imprint
+ IC and chip fabrication
+ Nanoscale imaging
Exhibition Dates and Hours:Tuesday 23 February 2016 | 10:00 am to 5:00 pm and 6 to 8 pm (poster reception)
Wednesday 24 February 2016 | 10:00 am to 4:00 pm

Exhibitors Information

Attendee Information

Show Contact
Contact: Sara Burns
Telephone: +1 360 676 3290 Fax:
City/State Country: United States  
Business Type: Trade Shows Organizer Phone Number: +1 360 676 3290
Fax Number: Contact Person Sara Burns

City/State/Country -
United States  
Business Type -
Trade Shows Organizer
Phone Number -
+1 360 676 3290
Fax Number -
Contact Person -
Sara Burns